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Paint Correction and Machine Polishing Flashcards

6 cards from real IDA practice questions. Tap to flip, then mark Knew It or Still Learning — missed cards come back until you master them.

Read the first 6 Paint Correction and Machine Polishing flashcards as text
  1. What is the correct procedure when starting machine polishing on a new panel?

    Answer: Spread the product first at low speed before increasing

    Spreading the compound or polish at low speed first prevents product from being flung off the pad and ensures even distribution before increasing machine speed.

  2. In IDA training, what is the 'cross-hatch' polishing technique?

    Answer: Alternating vertical and horizontal passes over a work area

    The cross-hatch technique alternates vertical and horizontal machine passes to ensure uniform defect removal and avoid directional marring.

  3. Which product should be used after compounding to refine the surface before applying a coating or wax?

    Answer: Finishing polish

    A finishing polish is used after compounding to refine the surface, remove light haze, and maximize gloss before protection is applied.

  4. What does 'RIDS' stand for in the context of paint defects?

    Answer: Random Isolated Deep Scratches

    RIDS stands for Random Isolated Deep Scratches, which are individual scratches that penetrate below the clear coat and generally cannot be fully polished out.

  5. Why should a detailer inspect paint under a high-intensity light source before polishing?

    Answer: To identify all existing defects and plan the correction approach

    High-intensity lighting reveals all surface defects including swirls, scratches, and oxidation, allowing the detailer to plan the correct products and techniques.

  6. What is the recommended orbital speed (OPM) for a finishing pass on a dual-action polisher?

    Answer: Medium-high speed (4,000–5,000 OPM)

    A medium-high speed of around 4,000–5,000 OPM on a finishing pass helps refine the surface and maximize gloss without introducing new defects.

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