During Casper system operation, the process recipe calls for a pressure ramp from 5 mTorr to 50 mTorr over 30 seconds. The throttle valve controller fails to track. What is the MOST likely result if the process continues?
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A
Improved etch uniformity
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B
Process deviation leading to out-of-spec results and possible wafer damage
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C
Faster pump-down on the next cycle
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D
No impact since pressure has minimal effect on Casper processes